MODIFIED EPOXY RESIN, PROCESS FOR PRODUCTION THEREOF, PHOTOSENSITIVE RESIN COMPOSITIONS AND PHOTOSENSITIVE ELEMENTS

摘要

A modified epoxy resin having repeating units represented by the general formula (1): wherein R<1> is a divalent organic group which is a residue derived from a diglycidyl ether-type epoxy compound; R<2> is a divalent organic group which is a dibasic acid residue; R<3> is hydrogen or a group represented by the general formula (2): (wherein R<4> is an acid anhydride residue); and n is an integer of 1 or above.