SYSTEM AND METHOD FOR INDUCTIVE COUPLING OF AN EXPANDING THERMAL PLASMA

摘要

A plasma generation system (300) is provided including a plasma generation apparatus (316) for generating thermal plasma and a plasma treatment chamber (318) external to the plasma generation apparatus (316) for receiving the thermal plasma from the plasma generation apparatus (316) and maintaining lower pressure in the plasma treatment chamber (318) than in the plasma generation apparatus (316) during plasma generation for causing the thermal plasma to expand within the plasma treatment chamber (318) and an inductor system (330, 332, 333) for inductively coupling the thermal plasma.