Photomask with dies relating to different functionalities

摘要

A photomask having dies relating to different functionalities is disclosed. A photomask for performing lithography in conjunction with fabrication of one or more semiconductor devices includes one or more first semiconductor dies and one or more second semiconductor dies. Each first semiconductor die relates to first functionality having a first definition grade. Each second semiconductor die relates to second functionality different than the first functionality. The second functionality has a second definition grade at least substantially close to the first definition grade. For instance, the second definition grade may be identical to the first definition grade, or it may be immediately adjacent (i.e., sequentially related) to the first definition grade.