POSITIVE PHOTORESIST COMPOSITION FOR MANUFACTURE OF SUBSTRATE WITH PORTIONS FOR INTEGRATED CIRCUIT AND FOR LIQUID CRYSTAL DISPLAY ON ONE SUBSTRATE, AND METHOD FOR FORMING RESIST PATTERN BY USING THE SAME

摘要

PURPOSE: Provided are a positive photoresist composition for system LCD, which shows excellent linearity, high resolution, good depth of focus(DOF), degassing suppression and heat-resistance, and a method for forming a resist pattern by using the same. CONSTITUTION: The positive photoresist composition comprises (A) an alkali-soluble resin component or (A') a resin component which is an alkali-insoluble or alkali-sparingly soluble but becomes alkali-soluble by the action of an acid, wherein the resin component is obtained by performing the purification via an ion-exchange resin prior to the formulation of the resist composition. Further, the method for forming a resist pattern comprises the steps of: applying the positive photoresist composition onto a substrate to form a coating; pre-baking the coated substrate to form a resist film on the substrate; selective exposing through a mask having both resist patterns for an integrated circuit(IC) below 2.0 m and for a liquid crystal display(LCD) above 2.0 m; post exposure baking; and developing using an aqueous alkali solution.