SCUFF RESISTANT COMPOSITIONS COMPRISING ETHYLENE ACID COPOLYMERS AND POLYAMIDES

摘要

Disclosed are compositions of ethylene acid copolymers and polyamides that are useful for fabricating films, sheets and molded articles for scuff and scratch resistant material and their application as decorative and protective films, comprising (1) from about 30 to about 65 weight % of a polyamide; and (2) from about 70 to about 35 weight % of a copolymer of (a) ethylene; (b) from about 5 weight % to about 15 weight % of an alpha,ß unsaturated C<3#191-C?8#191 carboxylic acid; (c) from about 0.5 weight % to about 12 weight % of at least one comonomer that is an ethylenically unsaturated dicarboxylic acid; and (d) from 0 weight % to about 30 weight % of monomers selected from alkyl acrylate and alkyl methacrylate, wherein the alkyl groups have from one to twelve carbon atoms; at least partially neutralized by one or more alkali metal, transition metal, or alkaline earth metal cations. Articles prepared from these compositions, such as films, show high toughness, good mechanical properties, excellent scratch and scuff resistance and, most importantly, good optical properties. More particularly, the compositions of ethylene copolymers and polyamides of the present invention can be used as protective coatings or layers on scuff- and scratch-exposed objects.