发明名称 FERROELECTRIC THIN FILM DEVICE, ITS MANUFACTURING METHOD, AND FERROELECTRIC MEMORY
摘要 PROBLEM TO BE SOLVED: To provide a ferroelectric thin film device which is capable of improving the degree of crystal orientation of an unpolarized ferroelectric thin film, and to provide its manufacturing method and a ferroelectric memory. SOLUTION: A lower electrode layer 2, an oxide crystalline nucleus layer 3, a ferroelectric thin film layer 4, and an upper electrode layer 5, are successively laminated on a base substrate 1 for the formation of the ferroelectric thin film device. The ferroelectric thin film layer 4 has a crystal orientation rate of 60% or above when it is unpolarized. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004356212(A) 申请公布日期 2004.12.16
申请号 JP20030149440 申请日期 2003.05.27
申请人 KYOCERA CORP 发明人 OFUNE MASABUMI;FUKUOKA SHUICHI
分类号 H01L27/105;H01L21/8246;H03H3/02;H03H9/17;(IPC1-7):H01L27/105 主分类号 H01L27/105
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