Laser microbeam machine for acting on thin film objects, in particular for chemically etching or depositing substance in the presence of a reactive gas

摘要

The machine of the invention comprises a sealed enclosure (10) in which a microscope objective lens (34) is fixed and receives a laser beam (36) via a thick transparent window (38), the enclosure also containing a reaction chamber (20) constituted by a sealed box having a lid which constitutes a thin transparent window (56) beneath which the thin film object (32) to be treated is placed. Means (72, 80, 74) serve to evacuate the enclosure (10) and the reaction chamber (20) and to convey reactive gas into the reaction chamber. The invention is particularly applicable to treating electronic circuits, hybrid circuits, etc.