FABRICATION OF ELECTRONIC DEVICES UTILIZING LITHOGRAPHIC TECHNIQUES

摘要

FABRICATION OF ELECTRONIC DEVICES UTILIZING LITHOGRAPHIC TECHNIQUES This invention concerns with a process for fabricating an article, such as an electronic device by the steps of forming a radiation-sensitive region on a substrate, patterning at least a portion of said region and further processing the substrate. The radiationsensitive region comprises polymers formed from monomers such as chloromethyl styrene and trimethylsilylmethyl methacrylate. Such polymers form negative-acting resists that are sensitive to exposure by electron beam and deep UV radiation. These materials are particularly useful in bilevel resist applications for fabricating masks or for device processing.