发明名称 |
Ceric-ion slurry for use in chemical-mechanical polishing |
摘要 |
The invention provides a chemical-mechanical polishing slurry comprising a liquid, cerium ions as an oxidizer, an abrasive, and a pH increasing substance. The cerium ions are in the liquid in a quantity equal to the inclusion of at least 0.02 molar ammonium cerium nitrate in the liquid. The abrasive is also included in the liquid. The liquid, the cerium ions and the abrasive jointly have a first pH value. The pH increasing substance increases the first pH value to a second pH value above 1.5.
|
申请公布号 |
US2004203245(A1) |
申请公布日期 |
2004.10.14 |
申请号 |
US20040836161 |
申请日期 |
2004.04.29 |
申请人 |
MILLER ANNE E.;FELLER A. DANIEL;CADIEN KENNETH C. |
发明人 |
MILLER ANNE E.;FELLER A. DANIEL;CADIEN KENNETH C. |
分类号 |
C09C1/68;C09G1/02;C09K3/14;C23F3/00;H01L21/321;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
C09C1/68 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|