| 摘要 |
PROBLEM TO BE SOLVED: To provide a position measuring method and an exposing method capable of enhancing mark detecting ability without increasing a mark position detecting time. SOLUTION: A mark SM formed on an object is image-picked up within a prescribed imaging field FV, and positional information of the mark SM is measured based on an image pick-up result therein. The imaging field FV is divided into a plurality of areas A, B, C, and the image of the mark SM is searched in order in every of the divided areas. In this exposure method, a pattern of the mask is exposed onto a substrate, after aligned using a mask mark on a mask and a substrate mark on the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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