BEAM SOURCE AND BEAM TREATMENT DEVICE EQUIPPED WITH BEAM SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a beam source with a low-cost structure capable of irradiating large-diameter beams on a treated object.

SOLUTION: The device is provided with a plasma generating chamber 16, plasma generating parts 20, 22 generating plasma 24 inside the plasma generating chamber 16, a first electrode 40 arranged inside the plasma generating chamber 16, a second electrode 50 arranged in opposition to the first electrode inside the plasma generating chamber 16, and a voltage impression part 52 drawing out particles from the plasma 24 generated in the plasma generating chamber 16 by impressing voltage between the first electrode 40 and the second electrode 50. The first electrode 40 is divided into a plurality of partial electrodes with a number of pores formed.

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