RESIST COMPOSITION AND ITS HARDENING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist composition which can prevent production of a defect in a substrate even when the resist film is made thinner in forming a fine pattern of a semiconductor substrate or the like and by which high accuracy processing of a substrate is performed.

SOLUTION: The resist composition contains a resist, fine particles comprising one of or both of fullerene and a fullerene derivative, and a crosslinking agent. The crosslinking agent preferably comprises a fullerene derivative, or borazine or a borazole derivative.

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