发明名称 |
WAFER HOLDING BODY FOR SEMICONDUCTOR MANUFACTURING DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE MOUNTED WITH IT |
摘要 |
PROBLEM TO BE SOLVED: To provide a wafer holding body for semiconductor manufacturing device having a wafer mounting surface improved in soaking property, and to provide a semiconductor manufacturing device mounted with the holding body. SOLUTION: In the wafer holding body having the wafer mounting surface, shafts which support the holding body are joined to the holding body. When the heat capacities of electrodes which feed electricity to an electric circuit formed on the surface of the wafer holding body except the wafer mounting surface or in the holding body in the shafts are adjusted to≤10% of the heat capacities of the portions of the wafer holding body corresponding to the insides of the outer peripheral sections of the shafts, the temperature distribution on the wafer holding surface can be controlled within the range of≤±1.0%. It is preferable that the electric circuit formed on the wafer holding body is at least a resistance heat generating body. COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004273866(A) |
申请公布日期 |
2004.09.30 |
申请号 |
JP20030064279 |
申请日期 |
2003.03.11 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
NATSUHARA MASUHIRO;NAKADA HIROHIKO;HASHIKURA MANABU |
分类号 |
H01L21/3065;C04B35/581;C04B35/634;C04B35/638;C23C16/458;H01L21/00;H01L21/205;(IPC1-7):H01L21/205;H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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地址 |
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