发明名称 Manufacturing method for semiconductor apparatus
摘要 Provided is a semiconductor apparatus manufacturing method capable of severing a base material without producing burrs. A multiplicity of semiconductor apparatuses are produced as follows. A multi-segment base material is obtained by mounting a multiplicity of semiconductor chips on a substrate having a wiring pattern, followed by sealing the semiconductor chips with resin, further followed by attaching a terminal portion having a terminal hole to a back surface of the substrate. A filler is charged in each terminal hole, and, after curing the filler, the base material is severed along a cutting line covering the terminal hole, whereupon the multi-segment base material is divided into separate semiconductor apparatuses. The terminal hole is left exposed along the cut surface of the semiconductor apparatus. Chilled water is applied to the filler filled in the terminal hole to remove it from the terminal hole.
申请公布号 US6790705(B2) 申请公布日期 2004.09.14
申请号 US20020236264 申请日期 2002.09.05
申请人 SHARP KABUSHIKI KAISHA 发明人 OKA JUNJI;KITANISHI SHIGENORI;NISHI TOSHIHARU
分类号 H01L23/12;H01L21/301;H01L21/304;H01L21/44;H01L21/46;H01L21/48;H01L21/50;H01L21/78;(IPC1-7):H01L21/44 主分类号 H01L23/12
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