发明名称 BORON DOPED DIAMOND
摘要 A layer of single crystal boron doped diamond produced by CVD and having a total boron concentration which is uniform. The layer is formed from a single growth sector, or has a thickness exceeding 100 µm, or has a volume exceeding 1 mm 3 , or a combination of such characteristics.
申请公布号 KR20040077674(A) 申请公布日期 2004.09.06
申请号 KR20047009241 申请日期 2002.12.13
申请人 发明人
分类号 C30B25/10;C30B29/04;C23C16/27 主分类号 C30B25/10
代理机构 代理人
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