发明名称 Inline detection device for self-aligned contact defects
摘要 The present invention provides an inline detection device for self-aligned contact defects, formed in a semiconductor substrate, comprising: an active area, formed in the semiconductor substrate, comprised of a serpentine gate having spacers on the side, a plurality of first contact windows nested immediately between the same spacers, a plurality of first contact plugs formed in the first contact windows, and two probing pads, formed in the semiconductor substrate, comprised of a plurality of matrix gates, a second contact window exposing portions of the matrix gates, and a second contact plug formed in the second contact window.
申请公布号 US6774394(B2) 申请公布日期 2004.08.10
申请号 US20020061562 申请日期 2002.02.01
申请人 PROMOS TECHNOLOGIES INC. 发明人 WANG TING-SING
分类号 H01L21/60;H01L23/544;(IPC1-7):H01L23/58;H01L21/66 主分类号 H01L21/60
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