| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing board for a rotary polishing machine for performing polishing by a compound distributed in the uniform thickness by avoiding concentration on the polishing board central vicinity of the compound caused by a difference in peripheral velocity between the central vicinity and the outer peripheral vicinity of the rotating polishing board by allowing only an outer peripheral part of the rotating polishing board to abut on a polishing surface at polishing work and glazing work. SOLUTION: This invention is the polishing board for arranging a fixing means, for example, a velvet fastener 4 to a rotary shaft of the rotary polishing machine on one surface side of an elastic plate 2, and the problem is solved by the polishing board for the rotary polishing machine for forming an abutting surface 3 with the polishing surface of a polishing object out of an outer peripheral part of the other side surface by arranging an annular wall 2b on the other side surface of the elastic plate 2. COPYRIGHT: (C)2004,JPO&NCIPI |
