发明名称 EXPOSURE APPARATUS FOR OPTICAL MOTHER DISK
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for optical mother disk which is compatible with various formats whose recording densities are greatly different like a CD or a DVD, downsized, realizes high speed exposure, and enhances the operability. <P>SOLUTION: In order to allow a diameter of an optical beam exposed on a resist side of an optical mother disk 3 through an objective lens 2 to cope with kinds of optical disks being objects of production, even after lenses remoter than a laser light source 20 configuring a beam expander 23 are switched into other lens 23C whose focal distance differs from that of the lenses, the axis of light passing through the lens 23C is aligned to the same optical axis as the case with a combination of the lenses 23A , 23B before the switching. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004185763(A) 申请公布日期 2004.07.02
申请号 JP20020354466 申请日期 2002.12.06
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MAEHARA KENJI;OMORI KENJI;ASHIBA HIROAKI;MIYAKITA HITOSHI
分类号 G03F7/20;G11B7/135;G11B7/26 主分类号 G03F7/20
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