| 摘要 |
A film deposition method for an optical disk of the present invention comprises a step (a) of carrying an optical disk substrate into a vacuum chamber, a step (b) of placing the optical disk substrate opposed to a target containing a film forming material, the target being provided in the vacuum chamber, and a step (c) of forming a predetermined film on the optical disk substrate according to a sputtering method using the target, the substrate being fixed, rotated on its axis, or revolved. When the target has a radius of a and the optical disk substrate has a radius of D, a > 2 x D is satisfied. With this configuration, it is possible to form uniform films of the optical disk in response to a higher density. <IMAGE>
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