| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display device which prevents contact between Al and ITO (Indium Tin Oxide) for higher reliability of elements by decreasing the number of times of photographic steps. SOLUTION: The method for manufacturing the liquid crystal display device includes stages of: forming a first metallic film on a substrate 110, then forming gate electrodes and gate patterns 112 to be used as gate pads by primary photoetching of the first metallic film; successively forming insulating films 114, semiconductor films 118 and second metallic films 120 on the gate patterns 112; and forming second metallic film patterns and semiconductor film patterns by secondary photoetching of the second metallic films 120 and the semiconductor films 118. Further, the method includes stages of: forming a transparent conductive film over the entire surface of the substrate 110; and forming data wiring 123, source electrodes 120a, drain electrodes 120b, and pixel electrodes 122 by ternary photoetching of the transparent conductive film, the semiconductor patterns and the second metallic film patterns. COPYRIGHT: (C)2004,JPO |
