ION IMPLANTING APPARATUS HAVING MANIPULATOR

摘要

PURPOSE: An ion implanting apparatus having a manipulator is provided to prevent the short between a voltage applying assembly and a bellows protecting guide by using ceramic for forming the front portion of the bellows protecting guide. CONSTITUTION: An ion implanting apparatus is provided with a manipulator(11), a suppression electrode(13) located at the rear portion of the manipulator, and a voltage applying assembly capable of applying a voltage to the suppression electrode. The ion implanting apparatus further includes a bellows protecting guide(17) located at the front portion of the manipulator to the suppression electrode direction. At this time, the front portion of the bellows protecting guide is made of ceramic.