| 摘要 |
Polycyclic fluorine-containing polymers and photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The polycyclic fluorine-containing polymer is derived from a repeat unit comprising the polycyclic reaction product of norbomadiene and a fluorolefin. The polymer may also contain a repeat unit derived from one or more additional monomers such as a fluorolefin, specifically tetrafluoroethylene, a fluoroalcohol, or an acrylate.
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