| 发明名称 |
PART MANUFACTURING METHOD, PART MANUFACTURING WORK SPACE AND PART |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a part with an excellent yield in a work space of completely removing a trace quantity of interspatial impurity remaining without being removed by a conventional removing method. <P>SOLUTION: This invention relates to a part manufacturing method characterized by manufacturing the part in the work space cleaned by contacting air of the space with a cation and an anion. <P>COPYRIGHT: (C)2004,JPO</p> |
| 申请公布号 |
JP2004125247(A) |
申请公布日期 |
2004.04.22 |
| 申请号 |
JP20020288836 |
申请日期 |
2002.10.01 |
| 申请人 |
SHARP CORP |
发明人 |
SHIMIZU YOSHIHIRO;NOJIMA HIDEO;YAGI HISAHARU;NISHIKAWA KAZUO |
| 分类号 |
F24F7/00;B03C3/02;B03C3/40;B03C3/66;(IPC1-7):F24F7/00 |
主分类号 |
F24F7/00 |
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