发明名称 |
Platen with patterned surface for chemical mechanical polishing |
摘要 |
A platen having a patterned upper surface for supporting a polishing material in a chemical mechanical polishing system is provided. In one embodiment, a platen for supporting a polishing material in a chemical mechanical polishing system includes a body adapted to support a polishing material during processing and having a substantially rigid non-planar upper support surface for supporting the polishing material during polishing.
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申请公布号 |
US2004072518(A1) |
申请公布日期 |
2004.04.15 |
申请号 |
US20030680631 |
申请日期 |
2003.10.07 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PRABHU GOPALAKRISHNA B.;RONDUM ERIK S.;MCREYNOLDS PETER;OSTERHELD THOMAS H.;LEUNG GARLEN C.;ARLUCK JACK;ZHONG ADAM H.;MENK GREGORY E. |
分类号 |
B24B37/04;(IPC1-7):B24B7/22 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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