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发明名称
高分子材料之合成方法、高分子薄膜之形成方法及层间绝缘膜之形成方法
摘要
本发明之目的在于确实形成一种有机高分子膜,其具有分子层次大小之孔洞且具高架桥密度。本发明系于溶液中使为路易士酸之第一单体与为路易士硷之第二单体与行路易士酸硷反应,由于第一单体与第二单体之微弱之电性相互作用键结而生成单体附加体。其次,将含单体附加体之溶液于基板上涂布,形成由单体付加体构成之超分子固体薄膜后,加热该高分子固体薄膜,藉由于超分子固体薄膜内部将第一单体与第二单体进行聚合反应,形成高分子薄膜。
申请公布号
TW200402800
申请公布日期
2004.02.16
申请号
TW092107509
申请日期
2003.04.02
申请人
松下电器产业股份有限公司
发明人
青井信雄
分类号
H01L21/312
主分类号
H01L21/312
代理机构
代理人
陈长文
主权项
地址
日本
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