METHOD FOR PREPARING POLYSILOXANE AND PHOTORESIST COMPOSITION COMPRISING SAME

摘要

PROBLEM TO BE SOLVED: To provide methods for synthesis of high resolution heat-resistant polysiloxanes (silsesquioxanes) and to provide photoresists comprising the same.

SOLUTION: A polysiloxane with photoacid-labile groups obtained by polymerizing a hydroxy-, alkoxy- or halo-substituted silane in the presence of a polymerization templating reagent with multiple reactive nitrogen groups, particularly a diamine reagent is mixed with a photoactive component.

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