Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate

摘要

A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photo-sensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 mum/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 mum/s or less.