| 发明名称 |
METHOD AND APPARATUS FOR REAL TIME MONITORING OF INDUSTRIAL ELECTROLYTES |
| 摘要 |
<p>The present invention relates generally to any electrolyte and methods for monitoring the consituents contained therein. More specifically, the present invention relates to platingbaths and methods for monitoring the constituents contained therein based on chemometricanalysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques of modelingpower, outlier detection, regression and calibration transfer for analysis of votammetric dataobtained for various plating baths.</p> |
| 申请公布号 |
WO2004009880(A1) |
申请公布日期 |
2004.01.29 |
| 申请号 |
WO2003US22151 |
申请日期 |
2003.07.16 |
| 申请人 |
TECHNIC, INC. |
发明人 |
WIKIEL, KAZIMIERZ;JAWORSKI, ALEKSANDER;WIKIEL, HANNA;HAZEBROUCK, DENIS |
| 分类号 |
G01N27/48;C23C18/31;C25C7/06;C25D21/12;C25F3/16;G01N27/416;(IPC1-7):C25D21/12;C25D21/18;C25D5/00 |
主分类号 |
G01N27/48 |
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