| 发明名称 |
Formation of composite tungsten films |
| 摘要 |
Methods for the deposition of tungsten films are provided. The methods include depositing a nucleation layer by alternatively adsorbing a tungsten precursor and a reducing gas on a substrate, and depositing a bulk layer of tungsten over the nucleation layer.
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| 申请公布号 |
US2004014315(A1) |
申请公布日期 |
2004.01.22 |
| 申请号 |
US20020299212 |
申请日期 |
2002.11.18 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LAI KEN K.;BYUN JEONG SOO;WU FREDERICK C.;SRINIVAS RAMANUJAPURAN A.;GELATOS AVGERINOS;CHANG MEI;KORI MORIS;SINHA ASHOK K.;CHUNG HUA;FANG HONGBIN;MAK ALFRED W.;YANG MICHAEL X.;XI MING |
| 分类号 |
C23C16/14;C23C16/02;C23C16/04;C23C16/08;C23C16/44;C23C16/455;H01L21/28;H01L21/285;H01L21/768 |
主分类号 |
C23C16/14 |
| 代理机构 |
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