| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas introducing method of a treatment apparatus for preventing two kinds of gases causing particle generation in a shower head part from being brought into contact and reaction with each other. SOLUTION: In a gas introducing method of a treatment apparatus comprising a treatment vessel 4 having a treatment space S to perform a predetermined treatment to a work W, a shower head part 8 to supply each gas to the treatment space by separately and simultaneously introducing or introducing at a different timing a raw gas and a reducing gas into different diffusion chambers 10A and 10B separated from each other, the combination of the gas kind of the raw gas and the reducing gas with the diffusion chamber is selected so that the differential pressure between the pressure in the diffusion chamber with the reducing gas supplied thereto and the pressure in the diffusion chamber with the raw gas supplied thereto is increased, and each gas is supplied. Ingress of one gas to the diffusion chamber side with the other gas by the reverse diffusion is effectively suppressed. COPYRIGHT: (C)2004,JPO
|
