发明名称 |
COMPOSITION FOR DENTURE BASE AND DENTURE FORMED BY USING THE SAME COMPOSITION AND METHOD FOR ADJUSTING DENTAL OCCLUSION OF DENTURE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve difficulty to adjust dental occlusion of dentures and extremely readily and surely carrying out improvement and control of dental occlusion. <P>SOLUTION: The composition for denture base comprises a liquid preparation consisting essentially of a radically polymerizable methacrylate and a powder material consisting essentially of a methacrylate polymer or a copolymer and a radical polymerization initiator, and a heat distortion temperature of a cured product obtained by polymerizing a mixture of the liquid preparation with the powder material is within the range of 25°C to 60°C. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2003327504(A) |
申请公布日期 |
2003.11.19 |
申请号 |
JP20020134878 |
申请日期 |
2002.05.10 |
申请人 |
KAMEMIZU KAGAKU KOGYO KK |
发明人 |
KAMEMIZU TADASHIGE;SASANO SATOSHI |
分类号 |
A61C11/00;A61K6/00;(IPC1-7):A61K6/00 |
主分类号 |
A61C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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