发明名称 Method for forming a MIM (Metal-Insulator-Metal) capacitor
摘要 Methods for forming a metal-insulator-metal (MIM) capacitor using an organic anti-reflective coating (ARC) are described. The first electrode of the MIM capacitor is formed from a first metal layer. The organic ARC is applied, and the second electrode of the MIM capacitor is formed from a second metal layer. The organic ARC is then removed using a nominal clean technique. Because the organic ARC is removed, the performance of the MIM capacitor is improved. Specifically, the breakdown voltage of the MIM capacitor increases and the leakage current decreases.
申请公布号 EP1359606(A2) 申请公布日期 2003.11.05
申请号 EP20030004088 申请日期 2003.02.25
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING ,LIMITED 发明人 NG, CHIT, HWEI;WEN, BAO, GUANG;SHAO, KAI;TJIN, TJAO, TJIN;CHU, SANFORD
分类号 H01L21/02;H01L21/027;H01L21/3213;H01L27/08;(IPC1-7):H01L21/02 主分类号 H01L21/02
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