发明名称 |
Process for calibrating the temperature measuring system of a high temperature reactor comprises preparing a calibrating plate with a doping material, determining the thickness of the layer, thermally treating, and further processing |
摘要 |
Process for calibrating the temperature measuring system of a high temperature reactor comprises preparing a calibrating plate with a first concentration of doping material having a layer with a second concentration of the doping material, determining the thickness of the layer, thermally treating the calibrating plate in the reactor at a theoretical temperature measured by the temperature measuring system, determining the thickness of the layer again, and determining the actual temperature in the reactor during heat treatment from the difference of the thicknesses of the layer between the change of thickness of the layer and the temperature during heat treatment. |
申请公布号 |
DE10216610(A1) |
申请公布日期 |
2003.10.30 |
申请号 |
DE2002116610 |
申请日期 |
2002.04.15 |
申请人 |
WACKER SILTRONIC AG |
发明人 |
STORCK, PETER;SIEBERT, WOLFGANG;ZIEGLER, JOERG |
分类号 |
C23C16/46;H01L21/324 |
主分类号 |
C23C16/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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