| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for beam drawing in which appropriate drawing is performed without increasing costs. SOLUTION: An electron beam to a first drawing region F1 performs drawing. A pattern is then drawn in a drawing region except a second drawing region F2 adjacent to the first drawing region F1 or a k-th drawing region Fk in a sequence so that the drawing region may be any one of from the second to (k-1)th drawing region. In other words, the drawing in the second drawing region F2 or the k-th drawing region Fk is not performed in the last (k-th) drawing region. Thus, time difference between the drawing in the first drawing region F1 and the drawing in the second drawing region F2 adjacent to the first drawing region F1 or the k-th drawing region Fk is reduced. As a result, the possibility of conforming patterns is more increased to perform pattern drawing processing with high accuracy. COPYRIGHT: (C)2004,JPO
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