发明名称 Methods and apparatus for testing a semiconductor structure using improved temperature desoak techniques
摘要 A semiconductor handling system has a temperature soak assembly to temperature soak a semiconductor structure (e.g., a panel), a test assembly to test the semiconductor structure, and a temperature desoak assembly to temperature desoak the semiconductor structure. The temperature desoak assembly includes (i) a heat sink that defines a surface which is configured to thermally couple with the semiconductor structure, (ii) a fluid guide coupled to the heat sink, and (iii) a fluid controller coupled to the fluid guide. The fluid controller provides a fluid (e.g., room temperature air) which the fluid guide directs over the heat sink to bring a temperature of the heat sink to a temperature of the fluid. This arrangement provides an effective low cost and low power means for temperature desoaking a semiconductor structure.
申请公布号 US6628132(B2) 申请公布日期 2003.09.30
申请号 US20010928001 申请日期 2001.08.10
申请人 TERADYNE, INC. 发明人 PFAHNL ANDREAS C.;DUNN, JR. JOHN J.
分类号 G01R31/28;(IPC1-7):G01R31/02 主分类号 G01R31/28
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