| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition decreased in the occurrence of development defects. <P>SOLUTION: The positive photosensitive composition is characterized in that it contains (A) a compound which generates an acid by irradiation of active rays or radiation, (B) a resin which decomposes by the effect to increase the solubility with an alkali developer, and (C) a specified fluoro-aliphatic group- containing polymer obtained from a monomer expressed by general formula (1). In general formula (1), R<SB>1</SB>represents hydrogen atom or methyl group, X represents oxygen atom, sulfur atom or -N(R<SB>2</SB>)-, m represents an integer from 1 to 6, n represents an integer from 2 to 4, and R<SB>2</SB>represents hydrogen atom or a 1-4C alkyl group. <P>COPYRIGHT: (C)2003,JPO |
