Apparatus and method for exposing substrates

摘要

An apparatus and method for double-sided imaging of a plurality of photoresist-coated substrates is provided. The apparatus includes a first and second substrate holder comprising at least three extendable chucks, each adapted to hold the substrate. The first substrate holder is mounted about a first axis and the second substrate holder is mounted about a second axis such that the at least three chucks are capable of rotation about the first axis between at least a first, second and third chuck positions. A first transfer arm is disposed adjacent the first substrate holder and adapted to transfer the substrate to a chuck of the first substrate holder when the chuck is in the first chuck position. A first mask is positioned adjacent the chuck in the second chuck position of the first substrate holder. A second mask is provided adjacent the chuck in the second chuck position of the second substrate holder. At least one radiation source is provided for emitting radiation through the first and second masks toward the chucks in the second chuck position of each of the first and second substrate holders. A second transfer arm adjacent the second substrate holder and adapted to transfer a substrate from the third chuck position of the second substrate holder.