| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing system that includes one or more magnetic units capable of generating a magnetic field. <P>SOLUTION: The polishing system 100 includes one or more magnetic units capable of generating a magnetic field. The magnetic units can plasticize a polishing material, and the plasticized material can polish a surface of a workpiece 113. The polishing material is in interrupted and repeated contact with the surface to develop polishing. A method is also provided for etching or embossing a predetermined pattern on the surface during magneto-rheological polishing of the surface. <P>COPYRIGHT: (C)2003,JPO |
