摘要 |
PROBLEM TO BE SOLVED: To provide a paste coating apparatus having a paste discharge mechanism preventing the stringing of paste or the generation of paste beads when a shutter is set to a closed state. SOLUTION: In the paste coating apparatus, a shutter projection 7 is provided to the surface of a shutter 2 present at a position, set in the vicinity of a paste passing hole in the moving direction of the shutter when the shutter becomes a closed state from an open state, and a groove 5 for the shutter projection 7, which is extended in the moving direction of the shutter and brings the shutter projection 7 to a fitting structure in a width/depth direction to permit the same to slide and communicates with a nozzle orifice at one end thereof, is provided to the surface of a shutter receiver 4 and the shutter projection 7 is allowed to move for the on-off operation of the shutter while fitted in the groove 5 for the shutter projection 7 to slide. COPYRIGHT: (C)2003,JPO
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