发明名称 GaN-BASED SEMICONDUCTOR BASE
摘要 PROBLEM TO BE SOLVED: To provide a base, where an AlGaN crystal layer having reduced dislocation density is grown, even while an LEPS method is being used. SOLUTION: Irregularities, where the LEPS method can be carried out, are machined on the surface of a crystal substrate 1, and a GaN-based crystal layer 2 is grown from the recess or projection. At this point, AlGaN layers 21, 23, 25, and 27, where an Al composition is small and AlGaN layers 22, 24, 26, and 28 where the Al composition is large are alternately grown as a lamination structure, and at the same time, they are grown, until an upper surface becomes flat. As a result, growth is made preferentially by the LEPS method while being AlGaN, and an AlGaN crystal layer is achieved.
申请公布号 JP2003151910(A) 申请公布日期 2003.05.23
申请号 JP20010352224 申请日期 2001.11.16
申请人 MITSUBISHI CABLE IND LTD 发明人 TADATOMO KAZUYUKI;OKAGAWA HIROAKI;OUCHI YOICHIRO;TSUNEKAWA TAKASHI
分类号 H01L21/205;H01L33/04;H01L33/22;H01L33/32 主分类号 H01L21/205
代理机构 代理人
主权项
地址