发明名称 |
MANUFACTURING METHOD OF SEMICONDUCTOR LIGHT EMITTING ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor light emitting element which can prevent generation of cracks in an interface between an Si substrate and a nitride semiconductor, and to provide the semiconductor light emitting element. SOLUTION: The manufacturing method of a semiconductor light emitting element comprises a process for providing a mask layer with a plurality of opening parts on a silicon substrate, and a process for forming a columnar multilayer structure body with a light emitting layer of a nitride semiconductor material. The mask layer between the opening parts is at most 10 μm thick. |
申请公布号 |
JP2003142728(A) |
申请公布日期 |
2003.05.16 |
申请号 |
JP20010338536 |
申请日期 |
2001.11.02 |
申请人 |
SHARP CORP;SAWAKI NOBUHIKO |
发明人 |
KOIDE NORIKATSU;YAMAMOTO JUNJI;DOKITA TAKESHI;SAWAKI NOBUHIKO;HONDA YOSHIO;KUROIWA HIROSUKE;YAMAGUCHI MASAFUMI |
分类号 |
H01L33/06;H01L33/16;H01L33/32;H01L33/34;H01L33/42;H01L33/44 |
主分类号 |
H01L33/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|