发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor light emitting element which can prevent generation of cracks in an interface between an Si substrate and a nitride semiconductor, and to provide the semiconductor light emitting element. SOLUTION: The manufacturing method of a semiconductor light emitting element comprises a process for providing a mask layer with a plurality of opening parts on a silicon substrate, and a process for forming a columnar multilayer structure body with a light emitting layer of a nitride semiconductor material. The mask layer between the opening parts is at most 10 μm thick.
申请公布号 JP2003142728(A) 申请公布日期 2003.05.16
申请号 JP20010338536 申请日期 2001.11.02
申请人 SHARP CORP;SAWAKI NOBUHIKO 发明人 KOIDE NORIKATSU;YAMAMOTO JUNJI;DOKITA TAKESHI;SAWAKI NOBUHIKO;HONDA YOSHIO;KUROIWA HIROSUKE;YAMAGUCHI MASAFUMI
分类号 H01L33/06;H01L33/16;H01L33/32;H01L33/34;H01L33/42;H01L33/44 主分类号 H01L33/06
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