发明名称 |
GAS SUPPLYING APPARATUS AND METHOD THEREFOR, AND FILM FORMING APPARATUS AND METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To individually supply each raw material of solution by vaporizing each material under an optimum vaporizing condition at the time of forming a composite metal oxide film by a solution vaporizing method using a multiple metal compound as the raw material. SOLUTION: The composite metal oxide film is formed by the reaction of gas composed of a plurality of multiple metal compounds and oxidation agent gas by introducing the gas into a film forming chamber 62 via a shower plate 64. The solution including a plurality of multiple metal compounds is individually vaporized with a vaporizer. The gas composed of a plurality of multiple metal compounds supplied from the vaporizer is uniformly mixed by a gas mixing unit 76 and then supplied to the shower plate 64.
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申请公布号 |
JP2003142473(A) |
申请公布日期 |
2003.05.16 |
申请号 |
JP20010335581 |
申请日期 |
2001.10.31 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
MAGARA TAKASHI;JINRIKI HIROSHI |
分类号 |
C23C16/448;H01L21/31;H01L21/316;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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