| 摘要 |
<p>A microwave plasma generating apparatus, wherein a microwave matching device (3) comprised of a quartz case packed with a dielectric material exhibiting a high frequency dielectric loss of a low value is provided at the interior of the side A of a cavity (1) having an arbitrary shape and filled with an inert gas, and a microwave reflector (4) is also provided at the interior of the side B of the cavity (1), and further a quartz tube (5) is provided in the cavity (1), being arranged between and connected to metal tubes (6) and (7) which are in turn connected to the sides C and D of the cavity (1), respectively.</p> |
