发明名称 |
TIN-BISMUTH ALLOY PLATING APPARATUS AND PLATING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a tin-bismuth alloy plating apparatus which is capable of applying tin-bismuth alloy plating of a stable bismuth concentration by effectively using the bismuth of a plating solution containing the bismuth of a high concentration and is capable of suppressing the formation of a lance-like deposit and a plating method. SOLUTION: This tin-bismuth alloy plating apparatus 40 is furnished with an anode 43 and cathode to be immersed into the plating solution 41 held in a plating bath 42 and voltage impressing means for impressing a voltage to the anode 43 and the cathode and applies the tin-bismuth alloy plating to a member 1 to be plated which is held in the plating solution 41, in which at least the surface of the anode 43 consists of a material nobler than the bismuth and the voltage impressing means impresses the pulse voltage to the electrodes.
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申请公布号 |
JP2003105597(A) |
申请公布日期 |
2003.04.09 |
申请号 |
JP20010303347 |
申请日期 |
2001.09.28 |
申请人 |
MITSUI MINING & SMELTING CO LTD |
发明人 |
KURIHARA HIROAKI;MATSUMURA YASUNORI;MAKITA HIDEAKI;KATAOKA TATSUO |
分类号 |
C25D5/56;C25D7/04;C25D17/10;C25D21/12;C25D21/14;(IPC1-7):C25D17/10 |
主分类号 |
C25D5/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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