发明名称 METHOD AND APPARATUS FOR REDUCING STRESS BETWEEN DEPOSITIONS WITHIN A SUBSTRATE TUBE
摘要 <p>A silica tube (20) has an inner porous silica layer. A halogen-containing gas (18) flows into the tube to dope the porous layer with the halogen. A second halogen is also added to the porous layer. Chlorine is one of the preferred halogens.</p>
申请公布号 WO2003027032(A1) 申请公布日期 2003.04.03
申请号 US2002028933 申请日期 2002.09.10
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