METHOD FOR DEPOSITING SUPERCONDUCTIVE THIN FILM USING MOCVD PROCESS

摘要

PROBLEM TO BE SOLVED: To deposit an RE-Ba-Cu-O based superconductive thin film which has a large area and a uniform compositional ratio by an MOCVD(metal organic chemical vapor deposition) process. SOLUTION: The superconductive thin film is deposited on a substrate by the MOCVD process. In this case,β-diketone is allowed to exist in a raw material MO gaseous mixture, so that the consumption of gaseous MO by thermal decomposition before its arrival at the surface of the substrate is prevented.