BATH UNIT OF WET CLEANING APPARATUS HAVING AUXILIARY SINK

摘要

PURPOSE: A bath unit of a wet cleaning apparatus having an auxiliary sink is provided to remove a leakage part beforehand and prevent environmental pollution by installing an auxiliary sink at the inside of a sink. CONSTITUTION: Deionized water(60) is used as cleaning solution in an HQDR(Hot Quick Dumped Rinse Unit)(10). An HQDR bath(21) is used for cleaning a semiconductor wafer(10). A shower portion(41) is installed at an upper end portion of the HQDR bath(21). A drain valve(23) is installed at one side of the HQDR bath(21) in order to drain the deionized water. A bubbler(25) is installed at a lower portion of the inside of the HQDR bath(21) in order to generate air bubbles. The HQDR bath(21) is located at a bath guide(35). The HQDR bath(21) is installed within a sink(31) and an auxiliary sink(51). The auxiliary sink(51) is located between the HQDR bath(21) and the sink(31). An auxiliary sink drain hole(53) is inserted into a drain hole(33) of the sink(31). A shielding guide(55) is installed at an upper end portion of the auxiliary sink(51).