| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming technique capable of efficiently forming a high resolution pattern for use in microfabrication using a radiation sensitive composition as a photoresist which can be developed with an aqueous alkali solution, has high sensitivity characteristics and is reversed from negative type to positive type in accordance with dose. SOLUTION: A pattern is formed through a step in which a radiation sensitive composition containing an aromatic compound having a negative forming functional group which makes an alkali-soluble group disappear by an acid catalyzed reaction and a positive forming functional group which makes an alkali-soluble group appear in the same molecule, an acid precursor and an alkali-soluble polymer is prepared and applied to form a radiation sensitive composition film, a step for irradiating the radiation sensitive composition film with radiation of a desired pattern shape, a step for heating the irradiated radiation sensitive composition film and a step for developing the heated radiation sensitive composition film with an aqueous alkali solution to allow a pattern to appear. |
