WET ETCHING/CLEANING APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD FOR THE SAME

摘要

PURPOSE: A wet etching/cleaning apparatus for fabrication a semiconductor device and a method for the same are provided to remove particles form a semiconductor wafer by performing a particle removal gas supply process. CONSTITUTION: An etching/cleaning solution supply tool(30) is formed with an etching/cleaning solution inflow tube(31), an etching/cleaning solution supply tube(34), and etching/cleaning solution supply outlets(32,33). The etching/cleaning solution supply tool(30) is connected with a driving device. A semiconductor wafer is loaded on a head(23) of an etching /cleaning spinner(20). a motor(21) is used for operating a spin pipe(22) of the etching /cleaning spinner(20). A particle removal gas supply tool(10) is installed on an upper portion of the etching /cleaning spinner(20). The alien substance prevention gas supply tool(10) supplies inert gases such as a nitrogen gas, an argon gas, and a helium gas to the semiconductor wafer.