| 发明名称 |
Process and apparatus for removing residues from the microstructure of an object |
| 摘要 |
A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including CO2, an additive for removing the residues and a co-solvent dissolving the additive in said CO2 at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. An apparatus for implementing the process is also provided.
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| 申请公布号 |
US2002164873(A1) |
申请公布日期 |
2002.11.07 |
| 申请号 |
US20020067773 |
申请日期 |
2002.02.08 |
| 申请人 |
MASUDA KAORU;IIJIMA KATSUYUKI;SUZUKI TETSUO;KAWAKAMI NOBUYUKI;YAMAGATA MASAHIRO;PETERS DARRYL W.;EGBE MATTHEW I. |
发明人 |
MASUDA KAORU;IIJIMA KATSUYUKI;SUZUKI TETSUO;KAWAKAMI NOBUYUKI;YAMAGATA MASAHIRO;PETERS DARRYL W.;EGBE MATTHEW I. |
| 分类号 |
B08B3/08;B08B3/10;B08B7/00;C11D7/00;C11D7/08;C11D7/26;C11D7/32;C11D7/60;C11D11/00;C11D17/00;F26B5/04;G03F7/42;H01L21/00;H01L21/304;H01L21/306;H01L21/311;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
B08B3/08 |
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